Carl Zeiss Launches New Photomask Registration System
JENA, Germany–(BUSINESS WIRE)–Carl Zeiss introduces its PROVE™ Registration and Overlay Metrology System for photomasks at SPIE Photomask Conference in Monterey, California. PROVE™ measures image placement on photomasks with superior resolution, meeting the challenging requirements of the 32nm technology node and beyond. Further extension of 193nm lithography to the next technology nodes by …

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